The Manufacturing Outlook: Specials Magazine

Kloe is democratising microtechnologies for breakthrough research and innovation. Microfabrication equipment has historically been expensive, complex and inaccessible to smaller labs and emerging industries. The global manufacturer and supplier offers a full range of photolithography machines engineered to deliver exceptional quality at a lower cost. From direct laser writers and exposure-masking systems to mask aligners and high-resolution 3D printers, the product line is designed with distinct specificities. Semiconductor, micromechanics, photonics, microfluidics, and more industries benefit from these compact, plug-andplay products, which make microtechnology accessible to a broader community. “We have consistently based our designs on bold and forward-thinking choices, enabling the development of versatile products while maintaining high-end performance,” says Dr. Paul Coudray, president. Trusted by global researchers and organisations, including NASA, Kloe’s advanced solutions are installed in over 50 countries across five continents. They are supported by a network of specialised distributors with local expertise to solve the evolving needs of their customers. Elevating Research with Advanced Photolithography Coudray’s journey to democratising high-resolution photolithography began with the development of Dilase 750, a versatile direct laser writer. Over the years, he expanded the Dilase range, offering a comprehensive suite of maskless solutions. But, direct laser writing proved too complex for microfluidics, an emerging field with growing research demands. Kloe introduced the UV-KUB 2, the first UV LEDbased masking technology, marking a significant advancement in the field. The compact and cost-effective solution provides precise UV exposure without the drawbacks of traditional mercury lamps. UV-KUB 2 positioned Kloe at the forefront of mercury-free lithography long before environmental regulations steered the industry in that direction. As microfluidics research advanced, the demand for multilevel patterning grew. Researchers sought an alignment function to enable more complex structures. Kloe developed UV-KUB 3, the first UV LED based mask aligner, combining submicronic resolution patterning (without vaccum contact) and high precision alignment and LED technology. It sets a new standard in mask aligners with a touchscreen interface, an embedded computer and advanced collimation technology. User safety remained a priority as Kloe innovated with the UV-KUB series. Its products are fully enclosed with automated safety mechanisms that turn off the light when the chamber opens. The design ensures safety, unlike other UV LED-based systems that expose users to high-intensity UV radiation. The UV-KUB 3 mask aligner is trusted by some of the world’s most demanding institutions, including NASA, which has qualified and adopted it for its applications. Meeting NASA’s stringent requirements marks a significant milestone and cements its position as a leader in next-generation photolithography solutions. Why Advanced Mask Aligners Lead the Way Kloe fine-tunes its mask aligners to deliver unmatched collimation and resolution.